Abstract: The far infrared refractive indices and the extinction coefficients of liquids can be obtained by means of spectroscopic ellipsometry in attenuated total reflection configuration. Such ...

The measurement systems typically used in fabs to measure and control film thickness include: Spectroscopic ellipsometry: Directed at an oblique angle to the wafer, it facilitates the simultaneous ...

These changes have led to a number of metrology challenges, including: Common spectroscopic ellipsometry doesn’t meet long term stability of gate oxide measurement. Single wavelength ellipsometry (SWE ...

Ellipsometry and reflectometry are optical measurement techniques used for surface analysis and thin-film characterization. 1 Both methods rely on light reflection but differ in their approach.

This free of charge workshop is aimed at both experienced ellipsometry users as well as people new to ellipsometry. The format of the workshop includes an introduction, fundamentals of ellipsometric ...

Spectroscopic ellipsometry is widely adopted in semiconductor processing, such as in the manufacturing of integrated circuits, flat display panels, and solar cells. However, a conventional ...

Polarization is a fundamental property of light waves. Originating from polarization, there are two categories of techniques: polarimetry and ellipsometry. Polarimetry is the technique for measuring ...

Conventional spectroscopic ellipsometry is a powerful tool in optical metrology. However, when it comes to the characterization of non-periodic nanostructures or structured fields that are much ...