Lam Research Corp. (Nasdaq: LRCX) today unveiled ALTUS® Halo, the world's first atomic layer deposition (ALD) tool that harnesses the capabilities of the metal molybdenum in the production of ...

Feb. 19, 2025 /PRNewswire/ -- Lam Research Corp. (Nasdaq: LRCX) today unveiled ALTUS ® Halo, the world's first atomic layer deposition (ALD) tool that harnesses the capabilities of the metal ...

Global memory semiconductor corporations, including Micron, plan to apply Lam Research's atomic layer deposition (ALD) equipment new products to 3D NAND flash memory mass production starting this ...

Lam said ALTUS Halo is the world's first atomic layer deposition, or ALD, tool that harnesses the capabilities of the metal molybdenum in the production of leading-edge semiconductors. Akara ...

Lam Research also showcased ALTUS Halo, an atomic layer deposition (ALD) tool that harnesses the metal molybdenum’s capabilities in producing leading-edge semiconductors. ALTUS Halo delivers ...

Lam Research (LRCX) unveiled ALTUS Halo, an atomic layer deposition tool that harnesses the capabilities of the metal molybdenum in the production of leading-edge semiconductors. ALTUS Halo is the ...

New Lam Research tools Akara and ALTUS Halo for building AI chips offer advanced plasma etch and ALD capabilities for complex 3D structures.

Leading foundries can use ASM’s ALD machines for the most critical layers and Applied Materials' or Lam’s CVD/PVD for more superficial ones. Foundries try to strike a balance between ...