News

Thermal atomic layer deposition (ALD) of metal has generally been achieved at high temperatures of around 300 °C or at relatively low temperatures with highly reactive counter reactants ...
Atomic layer deposition, or ALD, is a manufacturing approach that ... In plasma-enhanced ALD, the reactions are plasma-based, a method used by low-temperature applications. There are several ...
Imagine being able to deposit a film of material just a few atomic layers at a time. As impossible as that sounds, atomic layer deposition (ALD ... uses a plasma to lower the deposition temperature ...
Tantalum metal has been deposited with sub-nanometer control for the first time at low temperature without plasma by Wayne ... for strongly-reducing co-reagents capable of enabling atomic layer ...
This technique achieves atomic layer control and conformal ... about its economic viability due to low material utilization efficiency, around 50.4 %. CVD, while versatile, requires precise control of ...
This study presents a novel approach to depositing crystalline β-Ga₂O₃ films at low temperatures (as low as 200°C) using Plasma-Enhanced Atomic Layer Deposition (PEALD). Image Credit ...
Chemical engineers have developed a new method for atomic layer deposition, a technique commonly ... manufacturing materials that must be kept at low cost, e.g. catalysts and solar devices.
Feb. 19, 2025 /PRNewswire/ -- Lam Research Corp. (Nasdaq: LRCX) today unveiled ALTUS ® Halo, the world's first atomic layer deposition ... high-precision deposition of low resistivity, void ...
Plasma-derived atomic hydrogen (PDAH) enables low-temperature carbon dioxide methanation ... challenges like high energy consumption, carbon deposition on the catalyst, and the formation of ...
Atomic layer deposition (ALD) is a bottom-up nanofabrication deposition method that technically falls within the remit of chemical vapor deposition (CVD) methods; but it has become well-regarded as a ...
Revolutionary plasma source: Atomfab makes use of a patent-pending remote source that has been specifically developed for atomic-scale processing. Low damage for sensitive ... times and reliability ...