Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these ...

The two new fabs will be built on Intel’s Ocotillo campus in Chandler, Ariz ... capable of using extreme ultraviolet lithography, or EUV, an advanced chip fabrication method that means they ...

The storied Silicon Valley semiconductor company, with operations in Chandler, might be split in two, according to a Wall Street Journal report Feb. 15 that cited unnamed sources. Intel’s ...

Jan Brewer defended her newly signed package of tax cuts for business on Friday even though an Intel spokeswoman said the company made its decision to build a new $5 billion plant in Chandler ...

During the last quarter, Intel kept up a steady pace with the manufacture of 30,000 wafers.ts most recent high-NA EUV machines nearly match the performance of earlier EUV systems, yet they deliver ...

Intel's new ASML EUV machines are in production, aiming to regain its edge after years of lagging behind Taiwan Semiconductor. Intel plans to use ASML's high NA machines for 18A chip technology ...

Intel said the funding will go towards two new leading-edge logic fabrication plants and modernization of an existing site in Chandler ... the world's first High NA EUV lithography equipment ...

Leading-edge AI chips from Nvidia, AMD, and Intel already depend on EUV-fabricated 5nm and 3nm process nodes, and the shift toward 2nm gate-all-around (GAA) transistors will further increase demand ...

a Netherlands-based company that is the world’s only maker of extreme ultraviolet lithography (EUV) machines, which are a critical tool in the manufacturing of advanced chips. Intel said Meurice ...

During the last quarter, Intel kept up a steady pace with the manufacture of 30,000 wafers.ts most recent high-NA EUV machines nearly match the performance of earlier EUV systems, yet they deliver ...